Feasibility study: Development of localized electrochemical deposition for re-manufacturing
Reference number | |
Coordinator | CHALMERS TEKNISKA HÖGSKOLA AKTIEBOLAG - Material och tillverkningsteknik |
Funding from Vinnova | SEK 375 000 |
Project duration | October 2015 - July 2016 |
Status | Completed |
Venture | FFI - Sustainable Production |
End-of-project report | 2015-03707_SR_FS_Utveckling av lokala elektrokemiska deponeringsmetoder_en.pdf (pdf, 618 kB) |
Purpose and goal
The feasibility study aimed to investigate whether localized electrochemical deposition (LECD) can be used in the context of re-manufacturing of industrial parts. Re-manufacturing is an economical process that can save resources such as energy and materials. Hence, the development of LECD as a new technique to perform re-manufacturing fits the area of sustainable production. The results show that it is possible to repair a surface damage by use of LECD. Hence, the aim of the project is reached and the long-term goal to save resources in manufacturing of parts may be reachable.
Expected results and effects
Results of the pilot study show that it is possible to repair a surface damage by LECD. The confined bath concept, i.e. the limitation of the electrolyte to a certain area on the surface worked best. Since the confined bath method allows to perform pulse-electrodeposition, local deposition of nanocrystalline material can be envisaged. The positive outcome of the feasibility study opens up to continue the development work towards a future industrial implementation.
Planned approach and implementation
The feasibility study consisted of a literature study that led to the testing of three concepts for performing LECD using simplified sets. In the first concept, a microanode was used, in the second the electrolyte was confined to a specific area, and the third method was based on so-called liquid marbles which were placed at the location of interest. In all three concepts the process parameters were adjusted to achieve best possible deposits at sufficient growth rates.