Microstructures for High Resolution X-Ray and Neutron Imaging

Purpose and goal

The goal of the project has been to manufacture micro structures for X-ray and neutron imaging. These structures are needed in the development of imaging systems of the future. Etched structures in dimensions of some tenth of micrometers can be manufactured in a production process. Reflecting walls to improve light output has been manufactured and a stable process has been developed. The filling of scintillating/netronconverter material has successfully been made using a new technology based on centrifug filling. Devices for imaging has been manufactured.

Results and expected effects

Structured scintillators have been manufactured in a new unique process. To obtain stable reflecting walls, they are based on a stack of thin layers of deposited material . This is combined with the filling of scintillating material for X-ray detection. This plate is superior to what exists today. Neutron imaging structures have been developed based on semiconductor material and neutron converter filling. These materials convert neutrons into charged particled of MeV energies. Imaging detector systems that can compete with the best that exist on the market have been developed

Approach and implementation

The etching of the structures has been done using DRIE, Deep Reactive Ion Etching, a process that has been developed and optimized. The walls of the etched structures has been smoothed before the mirror deposition. The walls have been covered with a multilayer mirror structure, consisting of several layers for stability optimization. This part of the project has demanded an extensive process development using thin film technologies. A technique to fill the structures has been developed. A similar process has been developed for neutron imaging, including the formation of active walls.