A paradigm shift in thin film growth by magnetron sputtering: towards metal-ion-controlled process
|Coordinator||Linköpings universitet - IFM, Linköping University|
|Funding from Vinnova||SEK 491 000|
|Project duration||November 2018 - November 2019|
|Venture||Banbrytande idéer inom industriell utveckling|
|Call||Banbrytande idéer inom industriell utveckling - 2018|
Purpose and goal
This project aims to expand the process window for hybrid High Power Pulsed/dc Magnetron co-Sputtering (HIPIMS/DCMS) a novel PVD technique originating from our lab and based on a unique substrate bias control for effective metal ion-selection in the time domain. We will explore novel effects of metal-ion irradiation during film growth to develop new processing routes for next generation of functional coatings with applications predominantly in the area of wear-protective coatings, where Swedish PVD industry has played a leading role in many years.
Expected results and effects
Anticipated results are increased understanding of the metal-ion/film surface interactions during hybrid High Power Pulsed/dc Magnetron co-Sputtering (HIPIMS/DCMS) thin film growth, as well as, new processing routes for synthesis of next generations of thin film coatings for applications as wear-protective coatings.
Planned approach and implementation
The project activities are divided in four work packages: (WP1) Ion-energy distribution function measurements during HIPIMS/DCMS process, (WP2) determination of the ionization degree in the metal-ion flux to the substrate, (WP3) film growth experiments, (WP4) film characterization. The generated knowledge from WP1 and WP2 serves as input for WP3. The feedback from WP4 can be used to iterate between WP3 and WP4.