A paradigm shift in thin film growth by magnetron sputtering: towards metal-ion-controlled process

Purpose and goal

The original goal of this project - development of new processing routes for high-quality coatings at reduced substrate temperatures - could not be realized in the original form due to the problem with the availability of sputtering targets. Multiple interesting results were, however, obtained by changing the focus to another materials systems, including HfB2, TiAlWN, and TiAlSiN. Two manuscripts based on this work are now submitted to Journal of Vacuum Science and Technology A and Surface and Coatings Technology. Vinnova support has been acknowledged in six scientific articles.

Expected results and effects

Despite the fact that the originally planned experiments could not take place due to the lack of sputtering targets, we have tested our novel film growth approach for alternative systems. This resulted in a number of interesting results and four scientific publications are on the way. The accumulated evidence for the benefits of our new method will be used in the future applications. In addition, with the generated results we were able to get an industrial partner interested in the common application for the continuation of this project within the directed "Banbrytande ideer" call.

Planned approach and implementation

The project was divided into four work packages: WP1 - WP4, out of which WP1-WP2 devoted to plasma characterization have been successfully completed. Delayed delivery of sputtering targets necessary to conduct WP3-WP4 (accordingly to the original plan) forced the change of focus to another materials systems. This had no negative impact on the project goal as a number of interesting and unexpected results was obtained. Hence, the project well served the purpose of generating a portfolio of convincing evidence for the potential of our new method which can be used in future applications.