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Atomic Layer Etching for sub 10 nm semiconductor manufacturing - Proof of Concept

Reference number
Coordinator AlixLabs AB
Funding from Vinnova SEK 300 000
Project duration November 2019 - May 2020
Status Completed
Venture Innovative Startups
Call Innovative Startups step 1 autumn 2019

Purpose and goal

** Denna text är maskinöversatt ** The aim was to show that the innovative and patented method that AlixLabs has to allow the semiconductor industry to manufacture the most advanced circuits at a lower cost than today, works for high volume production. Important steps have been taken in this direction, and nothing has emerged so far which refutes the assumptions made, but the goal has not yet been met.

Expected results and effects

During the project, AlixLabs has established regular operations, taken important steps in the lab and established major partnerships that may have great future significance.

Planned approach and implementation

** Denna text är maskinöversatt ** The project has been carried out with our own staff in Lund NanoLabs´s premises, this has worked excellently and is also an absolute prerequisite with access to this type of Nanolab, we have also to some extent used Chalmers´ corresponding facility. The project planning can afterwards be seen as somewhat optimistic where more time needs to be reserved for preparation and instrument tuning.

External links

The project description has been provided by the project members themselves and the text has not been looked at by our editors.

Last updated 21 August 2020

Reference number 2019-03975

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