VINN Excellence Center in Research and Innovation on Functional Nanostructured Materials (FunMat)
| Reference number | |
| Coordinator | Linköpings universitet - Institutionen för fysik, kemi och biologi |
| Funding from Vinnova | SEK 21 000 000 |
| Project duration | January 2012 - December 2014 |
| Status | Completed |
Purpose and goal
Integration of research and development between the university and the companies in respective project. Develop an internationally competitive laboratory for excellence in materials science featuring: A range of thin film deposition techniques from monolayer surface functionalization to wafer or template production, state-of-the-art analytical instrumentation improved towards higher resolution and more advanced analytical functionality), Leading theoretical modeling and simulation capabilities Actively discuss openings for new innovative future center ideas.
Results and expected effects
Deposition of hard and dense coatings at lowered substrate temperature New coatings for cutting tools, developed and protected by patents, are now in product development stage within the companies. New generation of HIPIMS-based coatings from the TiAlMN family (M = Cr, Si) with improved performance and life time in high speed cutting applications A new generation of SiC-FET sensor device platform with improved selectivity Ti3SiC2 Ohmic contacts to SiC-FET sensors by sputtering from one (Ti) target Single layer graphene on SiC with metal decoration for improved selectivity
Approach and implementation
A network is formed for each research project involving small-to-large companies and one or more university groups with consulting institutes. At least one strong industrial partner acts as a driver for results. Avoid partnership where there is strong competition Industrial goals should be clearly defined with commercial interest. The scientists should be open-minded to industrial needs and solutions. Researchers submit innovation reports to industry partners and work together to draft patent applications.