Next generation laser for microlithography

Purpose and goal

The aim of the project was to investigate if it is possible to build a compact frequency doubled solid-state lasers based on a new type of semiconductor lasers (MOPA) as a replacement for the bulky and energy consuming ion lasers Mycronic AB presently use in their world leading photo mask pattern generators today. As the MOPA semiconductor lasers are smaller, cheaper and much more energy efficient than the ion lasers this could mean a great technological, environmental and economic advantage for Mycronic AB.

Results and expected effects

The investigation of the feasibility of using frequency doubled solid-state lasers based on a new type of semiconductor lasers has identified the challenges to reach a high enough power and beam quality. This has given an idea of how a future prototype should be realized.

Approach and implementation

The initial plan was revised due to delays in the supply chain. The delay was handled by the project team in accordance with the contingency plan, thus the project´s outcome targets could be reached. Evaluation of the MOPA laser incl. frequency doubling experiments have been performed. Optical power seem to be less of a problem. The beam quality has to be addressed, but it could be handled. Evaluation of the frequency doubling technique have been performed and the results are promising and in line with the assumptions prior to project start.