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A new type of plasma activated CVD process

Reference number
Coordinator Linköpings universitet - Institutionen för fysik, kemi och biologi
Funding from Vinnova SEK 500 000
Project duration November 2010 - October 2011
Status Completed

Purpose and goal

Our idea is to combine a highly energetical plasma using a newly developed plasma source to activate the gas phase chemistry in a CVD-process. The method is based on a hollow cathode with a pulsed power source to create a highly ionized plasma with very high density in combination with traditional CVD-gases. The aim of the project is to develop new ways to deposit new types of films that can not be synthesized with high quality and high deposition rate with todays methods.

The project description has been provided by the project members themselves and the text has not been looked at by our editors.

Last updated 25 November 2019

Reference number 2010-02008

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