A new type of plasma activated CVD process
|Linköpings universitet - Institutionen för fysik, kemi och biologi
|Funding from Vinnova
|SEK 500 000
|November 2010 - October 2011
Purpose and goal
Our idea is to combine a highly energetical plasma using a newly developed plasma source to activate the gas phase chemistry in a CVD-process. The method is based on a hollow cathode with a pulsed power source to create a highly ionized plasma with very high density in combination with traditional CVD-gases. The aim of the project is to develop new ways to deposit new types of films that can not be synthesized with high quality and high deposition rate with todays methods.