Smart Plasma Deposition Control of Physical Vapor Deposition (PVD) Processes for the Semiconductor Industry
| Reference number | |
| Coordinator | Ionautics AB |
| Funding from Vinnova | SEK 2 967 945 |
| Project duration | May 2026 - April 2028 |
| Status | Ongoing |
| Venture | Joint R&D projects for small and medium-sized enterprises in Sweden-Germany |
| Call | German-Swedish Call for joint R&D projects by Small and Medium-sized Enterprises spring 2025 |
Purpose and goal
The project aims to develop a smart, digitalized HiPIMS-based PVD platform integrating plasma generators, real-time diagnostics and automated process control. The objective is to enable stable, reproducible and conformal thin-film coatings on complex 3D structures in semiconductor applications. By controlling ionization and flux distribution in real time, the project will enable higher quality, more efficient processes and industrial scalability.
Expected effects and result
The project will deliver an integrated HiPIMS platform with real-time diagnostics and automated process control. The result will be stable, reproducible and conformal thin-film coatings on complex 3D structures. This enables improved material utilization, higher yield and lower energy consumption. The technology supports faster process development, reduced costs and strengthens Europe’s competitiveness in advanced semiconductor manufacturing.
Planned approach and implementation
The project is structured into five work packages covering diagnostics, development of control systems and power supplies, as well as integration and validation in an industrial environment. Iterative development is combined with real-time measurements and modeling to enable automated process control. Testing is performed at both lab and industrial scale. The project is led by Ionautics with clear roles across industry and academia and continuous project and IP management.