Nanopure Wafer clean

Purpose and goal

The project aims to validate NSS Waters’s patented technology for the production of nanopure water (NPW) according to semiconductor industry standards. The technology enables the production of extremely pure water directly at the point of use, free from particles larger than 5 nm. This is crucial for next-generation semiconductor manufacturing, where water quality has a direct impact on yield. We will focus on developing a test methodology and industrial validation.

Expected effects and result

The project is expected to result in us being able to validate our technology through test methods that are industrially adapted for the semiconductor industry. Expected results is that we have identified and performed standardized tests according to requested methods.

Planned approach and implementation

The project is being implemented in two work packages. First, test methodology is developed and optimized at the MC2 lab at Chalmers, where the WET technology is tested on a small scale. Then, the system is validated industrially at Fraunhofer IPMS in Dresden on 12-inch wafers according to semiconductor standards. The work is led by NSS Water and with support from experts from the industry.