MetroQR: Advanced Digital Metrology Demonstration for 200 mm Wafer Production Environments

Purpose and goal

Advances in semiconductor manufacturing at the leading edge are increasingly challenged by the need for metrology that is both precise and scalable as feature sizes continue to shrink (Moore’s Law). In collaboration with Obducat Technologies, this project is dedicated to the validation in a 200 mm semiconductor fab environment of Dappler Labs’ innovative, energy-efficient, and ultra-scalable dimensional metrology solution leveraging cost-effective and fast optical wafer inspection tools.

Expected effects and result

The successful introduction of Dappler Labs´s technology to industry could result in a drastic reduction in cost, time and energy for generating metrology data in the routine operations of any semiconductor fab, and for generating massive metrology datasets at the nanoscale required to train AI tools being developed by industry to address current and emerging manufacturing challenges.

Planned approach and implementation

We will test MetroQR for development and monitoring of lithography and etch processes in semiconductor manufacturing using a 200 mm wafer production line, and benchmark the results obtained using Dappler Labs´ technology against standard metrology used in the fab.