Group 13 Metal Nitrides by Both Chemical Vapour Deposition and Atomic Layer Deposition
Reference number | |
Coordinator | Linköpings universitet - IFM, Linköping University |
Funding from Vinnova | SEK 1 855 230 |
Project duration | July 2016 - December 2017 |
Status | Completed |
Important results from the project
The first purpose of this funding was to establish a lasting collaboration between Linkoping University (LiU) and Carleton University (CU), exchanging training, supervision, research, and publication. This has been achieved with two publications, one manuscript in preparation, and training of a CU PhD in CVD, and an LiU post-doc in main group synthesis. The second purpose was to test novel aluminum and gallium precursors for deposition of nitride films: an inexpensive and simple aluminum precursor was identified that produced very low-carbon aluminum nitride films.
Expected long term effects
The funding permitted an extensive communication between two groups with complementary expertise. This has led to enhanced scientific skills at both CU and LiU, as well a long-term, supported research program investigating group 13 nitride thin films. This Vinnova funding allowed Prof. Sean Barry and Ms. Sydney Buttera (PhD candidate) extended time to better understand the material science of thin film deposition, as well as to transfer synthesis and thermal characterization skills and knowledge to researchers at LiU.
Approach and implementation
Trisguanidinate compounds were synthesized and thermally characterized at CU. The idea to transport these to LiU for deposition studies was unfeasible, so the LiU research team established a synthetic expertise, and synthesis and thermal characterization knowledged was transferred there by supervision by Prof. Sean Barry, and by Ms. Sydney Buttera. Although this has extended the time-scale of testing these precursors for nitride film deposition, it has estabvlished a stronger base at LiU to go forward in the use of novel precursors.